期刊文献+

GaN生长工艺流程实时监控系统 被引量:1

Real-time Monitoring System of GaN Growth Process
下载PDF
导出
摘要 文章分析了在ECR-MOCVD装置上外延生长GaN单晶薄膜的工艺过程特点和在此过程中影响GaN结晶质量的主要因素。在此基础上,设计了一套由80C31单片机为核心的光电隔离电路和PC机组成的两级系统,用于GaN薄膜外延生长的工艺流程监控,并提出了一种合适的工艺流程监控策略。 We analyze the process characteristics of epitaxy growth for GaN single- crystal films using ECR- MOCVD devices,and the main questions which effect the GaN crystalline quality during the epitaxy growth. Then,we design a set of monitoring system comprised of PC computer and photoelectric circuits based on 80C31 microcomputer,which was used in the epitaxy growth process of GaN film. At the same time,we proposed a kind of suitable monitoring method for process. The practical application shows that our reasonable software and hardware system designs,it also shows our reasonable anti- interfere design. All of these ensure our growth process is continuous,meanwhile,the accuracy of our experiment parameters and the reproducibility of our growth process are improved significantly. It also has guidance value for automatic design of similar growth process to some extent.
机构地区 大连理工大学
出处 《微电子学与计算机》 CSCD 北大核心 2002年第1期60-64,共5页 Microelectronics & Computer
基金 国家863项目新材料领域课题(715-011-0033)
关键词 ECR-MOCVD 外延生长 GAN 半导体材料 工艺流程 实时监控系统 ECR- MOCVD, Epitaxy growth,GaN film,Real- time monitoring, Photoelectric- isolated.
  • 相关文献

参考文献3

  • 1何立民.MCS-51系列单片机应用系统设计[M].北京:北京航空航天大学出版社,1996..
  • 2严镌薇等.计算机实时控制软件设计导论.北京:清华大学出版社,1990.
  • 3王士元.C高级实用程序设计[M].北京:清华大学出版社,1997..

共引文献30

同被引文献3

  • 1[4]MUKAI T, NARIMATSU H,NAKAMURA S. Amber InGaN-based light-emitting diodes operable at high ambient temperatures[J]. Jpn J Appl Phys,1998, 37(5A):L479-481.
  • 2[3]STRITE S, MORKOQ H. GaN and InN [J]. J Vac Sci Technol, 1992,B 10(4): 1237-1240.
  • 3梁春广,张冀.GaN——第三代半导体的曙光[J].Journal of Semiconductors,1999,20(2):89-99. 被引量:88

引证文献1

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部