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过氧聚钨酸薄膜上光栅的制备

Fabrication of Diffraction Grating Based on the Peroxopolytungstic Acid Thin Film
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摘要 用过氧聚钨酸 (PPTA)水溶液 ,通过离心涂膜法在显微镜载玻片上制备了具有光滑表面且厚度为 1 0 0nm的 PPTA薄膜 .利用 PPTA薄膜在紫外光照下可硬化的特点 ,在薄膜上制备光栅进行研究并通过双光束干涉曝光法 ,制备了凹面光栅 .结果表明 ,PPTA是作为研制光栅以及其它光学元件的薄膜材料 。 The peroxopolytungstic acid (PPTA) thin films, thickness of 100nm, has a smooth surface easily formed from their aqueous solution on the glass slide by using the spin coating method. The concave diffraction grating on the film of PPTA is prepared by the double beam interference illumination. The results of the experiment show that this material has a widely applied prospect as diffraction grating and other optical element.
出处 《新疆大学学报(理工版)》 CAS 2002年第1期72-74,共3页
关键词 过氧聚钨酸薄膜 光栅 双光束干涉曝光法 光集成回路 制备原理 离心涂膜法 peroxopolytungstic acid thin film diffraction grating
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