摘要
用X射线光电子能谱 (XPS)研究了工艺参数 (注入电压或能量、注入时间或剂量、磁控靶溅射电流 )对铝合金LY12 (即 2 0 2 4 )等离子体基离子注入氮 +离子注入钛形成的改性层成分分布影响 .结果表明 ,氮在注入层呈高斯分布 ,而钛沿注入方向逐渐减少 .钛的注入使已注入的氮的分布有所拓宽 .随着注入电压和时间的增加 ,钛的注入深度及含量有所增加 ;存在一个注入时间或 /和磁控靶溅射电流阈值 ,在低于该值下注入钛主要表现为注入效应 ,没有钛沉积层出现 ,在高于该值下注入钛由注入效应逐渐表现为沉积效应 。
The effect of parameters (implanting voltage (energy), implanting time (dose) and titanium target sputtering current) on the composition depth profiles in the modified layers of aluminum alloy 2024 implanted with Ti after pre-implanted with N by PBII was characterized by X-ray Photoelectron Spectroscopy (XPS). The results show that N and Ti can be implanted into 2024 effectively, and the depth profile of N in the implanted layer is near Gaussian Distribution, and that of Ti decreases gradually along the implanting direction from the surface. The process of implanting Ti makes the depth profile of the implanted N broaden. As the implanting voltage (energy) and the time (dose) are increasing, the depth profile and the content of Ti increase. The result also shows that there is a max of implanting time (dose) or/and titanium target sputtering current. Implanted with Ti at less than the max value, the preponderance of implantation for Ti has been represented without any Ti deposited layer on the surface, while implanted at more than the max value, the preponderance of deposition for Ti has been exhibited with an obvious Ti layer on the surface.
出处
《哈尔滨工业大学学报》
EI
CAS
CSCD
北大核心
2002年第1期44-48,共5页
Journal of Harbin Institute of Technology
基金
国家自然科学基金资助项目 (5 97710 5 9)
