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凹型Si微透镜阵列的制作 被引量:2

FABRICATION OF Si CONCAVE MICROLENSES ARRAY
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摘要 提出了一种新的曲率倒易法首次成功地在Si衬底上制作出 6 4× 2 5 6凹柱面折射微透镜阵列 ,扫描电子显微镜 (SEM)显示微透镜阵列为表面轮廓清晰的凹柱面阵列 ,表面探针测试结果显示凹微透镜阵列表面光滑、单元重复性好 ,其平均凹深为 2 .6 43μm ,凹深非均匀性为 8.45 % ,平均焦距为 - 47.0 8μm . 64 x 256 elements Si concave microlenses array was fabricated by a new method, i.e. the curvature inversion method. Scanning electron microscope (SEM) shows that microlenses have distinct concave cylinder contour. Surface stylus measurement shows that the concave microlenses array has smooth surface and uniform dimensions. For the concave microlenses array, the average depth of concave spherical surface is 2.643mum, the nonuniformity of the depth is 8.45% and the average focal length is -47.08mum.
出处 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2002年第1期33-36,共4页 Journal of Infrared and Millimeter Waves
基金 国家自然科学基金 (编号 6 0 0 0 86 0 0 3)资助项目~~
关键词 SI 凹微透镜阵列 氩离子束刻蚀 制作 曲率倒易法 Si concave microlenses array Ar ion beam etching
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