摘要
用束衍生法研究了深亚微米同步辐射 x射线光刻中掩模吸收体的光导波效应 ,并对 x射线光刻后的光刻胶剖面进行了理论计算。采用面向对象技术 ,研制了一个取名为 XLLS1 .0的模拟软件。
The beam propagation method is used to investigate the absorber waveguide effect in deep micron synchrotron radiation x ray lithography,and the resist profile after x ray exposure is calculated theoretically.Using object oriented programming technology,a simulation software called XLSS1 0 has been developed recently.The detail of this software is described in this paper.
出处
《半导体情报》
2001年第6期36-38,44,共4页
Semiconductor Information
基金
国家"九五"科技攻关资助项目 (97-762 -0 3 -0 3 )
关键词
X射线光刻
模拟
同步辐射
深亚微米
半导体工艺
x ray lithography
simulation
synchrotron radiation
beam propagation method
object oriented programming
