氧化层对硅片上生长Au膜微结构的影响

Effects of the Oxidation Layer Upon theMicrostructure of Au Thin Film

采用 X-射线衍射与扫描电镜观察相结合研究了中间氧化层对硅片上沉积 Au- As合金薄膜的微结构的影响 .结果表明 :氧化层一方面影响 Au- As合金膜的成核生长 ,使其晶粒细化和生长速率下降 ;另一方面 ,氧化层降低了 Au- Si界面扩散反应的程度 ,阻止新的 Si-Au合金相的生成 .

In this paper the effects of the oxidation layer upon the microstructure of Au-As thin film deposited on Si is investigated by means of X-ray diffraction and SEM.It has been found that the oxidation layer exerts influence upon the growth rate,grain size and interfacial structure of the thin film on the one hand,and prevents both the interfacial diffusion of Au-As interface and the formation of Si-Au alloy phase on the other hand.