摘要
报道了掠入射软X光平面镜反射率标定实验。实验利用北京同步辐射装置 (BSRF) 3W 1B束线及反射率计靶室 ,在束流 35mA～ 110mA、贮存环电子能量 2GeV专用光运行模式下 ,在 5 0eV～ 85 0eV能区分四个能段 ,进行了 5°掠入射Ni平面镜反射率标定实验。标定过程中用高灵敏度无死层的硅光二极管代替X射线二极管作探测器 ,输出信号提高 2～ 3个量级 ,可标定能区从 15 0eV～ 2 70eV拓展到 5 0eV～ 85 0eV ,给出了完整的 5°Ni平面镜反射率标定曲线。最后把实验数据与理论计算作了比对并进行了分析。
The calibration experiment of glancing incidence soft X ray planar mirror reflectivity is reported. The Beijing synchrotron radiation facility(BSRF) 3W1B beam line and target chamber with reflectometer was used. Under the specific operation mode of beam current 35 mA～110 mA, the storage ring electron energy 2 GeV, photon energies 50 eV～850 eV. 50 eV～850 eV energy region was divided into four energy sections. The calibration experiment for reflectivity of 5° grazing incidence Ni planar mirror was done. High sensitivity silicon photodiode without dead layer was used as detector replacing \{X ray\} diode during the calibration. Therefore,2 to 3 orders of magnitude of the signal noise ratio are increased, and the calibration region is expanded from \{150 eV～270 eV\} to 50 eV～850 eV. The entire calibration curve for 5° Ni planar mirror reflectivity is given. The values of experiment and theoretical calculation are compared and analyzed.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2002年第3期379-382,共4页
Acta Optica Sinica
基金
国家高技术 86 3 416 3资助课题
