直流射频耦合制备微纳结构AZO薄膜及其性能研究

Study on fabrication and properties of micro-nano structure AZO films by DC coupled RF sputtering

采用直流射频耦合磁控溅射法结合线棒刮涂法在玻璃衬底上室温生长微纳结构铝掺杂氧化锌(AZO)薄膜,底层AZO薄膜射频功率占比从50%调整到90%。通过扫描电子显微镜(SEM)、X射线衍射仪(XRD)、霍尔效应测试系统、紫外可见分光光度计、光电雾度仪重点研究了AZO薄膜的表面形貌、晶体结构、电学性能和光学性能。研究结果表明,提高底层AZO薄膜射频功率占比对微纳结构AZO薄膜光电性能有显著的影响,底层AZO薄膜射频功率占比80%时薄膜表现最低电阻率5.32×10^(-4)Ω·cm,可见光波段平均光学雾度36.3%。随着底层AZO薄膜射频功率占比的增加,薄膜表面形貌、生长形态和结晶性能发生较大变化,并得到具有陷光作用且光电性能优良的微纳结构AZO薄膜。

Micro-nano structured Al-doped ZnO thin films were deposited by DC-RF coupled magnetron sputtering system binding winding bar scraping coating on glass substrates at room temperature. The RF sputtering power ratio of basement AZO film was adjusted from 50% to 90%. The structure, surface morphology, optical and electrical properties of the micro-nano structured AZO films were investigated by X-ray diffractometer, scanning electronic microscope, Hall effect test system, ultraviolet-visible spectrophotometer and WGW, respectively. The results indicate that the resistivity of the micro-nano structured AZO film is dominated by RF sputtering power ratio of the basement AZO film. The films deposited under RF sputtering power ratio of 80%exhibit the lowest resistivity of 5.32 ×10-4Ω·cm. The average optical haze is approximately 36.3% in the visible wavelength.With the increase of RF sputtering power ratio, the surface morphology, growth form and the particle size of the films change greatly. Meanwhile, the micro-nano structured AZO films show light trapping effect and excellent optical and electrical properties.