铜基等离子体喷涂钨涂层性能

Characterization of PS-W Coating on Cu Substrate

阐述了钨涂层微观结构影响机理以及涂层性能。通过等离子体喷涂工艺参数及微观形貌分析涂层微观结构和参数对涂层性能的影响,工艺参数主要包括喷涂功率、喷涂距离、送粉气量等。结果显示钨涂层是由钨粒子熔融沉积平铺成"圆饼状"或"花瓣状"的单层叠加而成,单层呈现柱状晶微观结构,厚度约10μm、直径约50μm的"圆饼状"单层是状态比较好的涂层结构。钨粒子熔化状态、沉积速率以及喷涂环境决定了熔化粒子的沉积形貌;与大气喷涂相比,真空喷涂钨涂层气孔率低、传热性能和结合性能较好,适合作为面对等离子体材料的制备技术。

The mechanism of micro-structure and coating performance of tungsten coating were discussed.The influence of spraying parameters on the properties of plasma spraying tungsten coating includ the spraying power, spraying distance and pulerized gas delivery.The results indicate tungsten molten drop spread to form the pancake morphology or flower morphology owing to singel layer overlying,which is the columnar crystal microstructure.The particle molting state,the deposition velocity and the spraying environment determine the morphology of tungsten coating.And the pancake morphology with a thickness of about 10μm and a diameter of about 50μm is the better coating structure.Compared with atmospheric plasma spraying tungsten coating,vacuum plasma spraying tungsten coating has lower porosity,better heat transfer capability,better bonding strength and less oxygen content.Therefore, tungsten coating used as plasma facing material is feasible.