TiAlON涂层微观结构与光学性质研究

MICROSTRUCTURE AND OPTICAL PROPERTY OF TiAlON COATINGS

通过控制氧气与氮气流量比,使用反应磁控溅射技术在抛光硅片表面制备TiAlON涂层。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)、光谱椭偏仪(SE)分析氧氮比对涂层的微观结构与光学性能的影响。结果表明,TiAlON涂层具有与TiAlN涂层相同的面心立方结构(NaCl型)。随着溅射氧气分压的升高,涂层的柱状晶结构变得模糊。通过控制涂层的成分,TiAlON涂层的光学性质可由类金属特性向半导体特性以及陶瓷特性转变,说明TiAlON涂层具有可控的光学常数,可作为太阳能光谱选择性吸收涂层的候选材料。

TiAlON coatings are deposited on polished silicon wafer surface by reactive magnetron sputtering technique through controlling oxygen and nitrogen flow ratio.X-ray diffractometry (XRD),scanning electron microscopy (SEM), transmission electron microscopy (TEM),and spectroscopic ellipsometry (SE)are used to analyze the effect of oxygennitrogen ratio on the microstructure and optical property of the coating.The results show that TiAlON coating has the same face centered cubic structure (NaCl type)as TiAlN coating.The columnar crystal structure of the coating becomes ambiguous with the increase of O2 partial pressure.By controlling the composition of the coating,the optical property of the TiAlON coating can be transformed from metal-like property to semiconductor property and ceramic property.The TiAlON coating has a controllable optical constant and can be used as a candidate for solar spectrum selective absorbing coatings.