光固化微压印制作微结构阵列成型工艺

Fabrication of Microstructure Array by UV Curing Microimprint Lithography

研究了一种光固化微压印制作微结构阵列的工艺。常温下,在自制的模板上涂覆自主研制的专用液态光敏材料,用自主研制的光固化微压印设备进行压印,同时通过紫外光照射固化成型,制备出两种表面微结构阵列-六棱柱形微结构阵列和圆柱形微结构阵列,并对所制备的微结构阵列进行了检验。结果表明:光固化微压印制备的微结构单元具有良好的一致性,微结构阵列复制度高、完整性好。该成型工艺具有高效率、低成本、绿色环保的优势,并且能够满足微结构阵列批量化生产的要求。

A photochemical microimprinting technology for fabricating microstructure arrays was introduced. Under ambient temperature, the self-made template was used to impress the self-developed liquid photosensitive resin. Meanwhile, the surface microstructure array was prepared by UV irradiation and solidifi cation molding. According to the process requirements, an optical microimprint lithography equipment has been developed, the six prism microstructure array and cylindrical microstructure array were fabricated by this device, and the microstructure of the fabricated arrays was tested. The results show that the microstructural units fabricated by photochemical micropressure have good consistency, and the microstructures have high replication and good integrity. The forming process has the advantage of high effi ciency, low cost, and environmental protection, and can meet the requirements of mass production of microstructural arrays.