直热式ITO靶材热压设备的设计

Fabrication of Indium/Tin Oxides Target by Direct Resistive Heating in Hot Press Furnace

随着平面显示技术的发展,氧化铟锡(ITO)靶材的需求大增,然而国内生产的靶材多为低密度的中低端产品,ITO靶材的制备目前多采用的是热压烧结的形式,实现ITO靶材的制备突破研制合适的装备及工艺成为焦点问题。本文结合直热式制备ITO靶材工艺给出了ITO靶材热压炉中核心加热区的设计方法,并利用ANSYS软件对设计完成的石墨模具进行了仿真分析。

High density target of indium tin oxides( ITO) was fabricated in a novel technique: rapid direct resistive heating in argon atmosphere with the home-built hot press furnace. The original work included the direct resistive heating with switch power supply and the female dies designed via numerical simulation with ANSYS software,made of carbon-carbon composite material and strengthened with molybdenum wire,5 mm in diameter. The newly-developed ITO fabrication technique outperforms the conventional ones,including the cold pressing/sintering,hot isostatic pressing,sintering and hot pressing,because of higher density of ITO target,better crack-resistance,lower production cost,smaller equipment budget,and oxygen-free pressing atmosphere.