电解抛光后铝箔表面粗糙度对阳极氧化铝模板孔间距的影响

Interpore Distance Dependence of Anodic Aluminium Oxide Films on High-Purity Aluminium Sheet Surface Roughness Controlled By Electropolishing

利用不同粗糙度的高纯铝箔在0.3 M草酸中制备阳极氧化铝模板,采用有限元数值分析方法建立二维模型,研究粗糙度对氧化电场的影响。研究表明,随粗糙度由5 nm增大到50 nm,模板孔间距从80 nm减小至70 nm;铝箔表面的显微不平造成了反向电场。粗糙度增大使反向电场增强,膜内的平均电场被削弱,从而使模板孔间距减小。

Anodic alumina template was prepared by using high-purity aluminum foil with different roughness in 0.3 M oxalic acid, and two-dimensional model was established by finite element numerical analysis method to study the influence of roughness on oxidation electric field. The results show that as the roughness increases from 5 nm to 50 nm, the spacing of template holes decreases from 80 nm to 70 nm. Microirregularities on the surface of aluminum foil cause a reverse electric field. The increase of roughness enhances the reverse electric field and weakens the average electric field in the membrane, thus reducing the spacing of template holes.