电解致酸脱保护DNA在片合成研究

In situ synthesis of DNA microarray by means of deprotection with acid by electrolysis

提出了以电解致酸脱保护法为特征的电助DNA在片合成新方法 .在 2 .0V电解电位下电解水 ,释放氢离子并富集于阳极极板附近 ,导致局部酸度增强 ,使核酸单体分子发生脱保护反应 .测定了该合成方法的合成产率与电解时间 ,支持电解质浓度 ,水浓度等条件的关系 .结果表明 ,电解时间越长 ,脱保护效率越高 ,两者基本呈线性关系 ;

In order to develop an approach to prepare high-density genechip with in situ synthesis, the authors propose a way to synthesize DNA microarrays by means of deprotection with acid generated by electrolyzing some substances in solvent. Water can release protons when electrolyzed at 2.0 V, leading to the increase of acidity on anode. Therefore, DMT protecting group can be removed. The relationship between the synthesis efficiency and other conditions, such as electrolysis time, concentration of electrolyte, concentration of water and so on was measured. It was found that the longer the electrolysis time, the higher the deprotection efficiency. The concentrations of electrolyte and water have little influence on deprotection efficiency.