多元Ti(CN)膜的制备和性能研究

Manufacture of the multi-component Ti(CN) film and the study on it's properties

为研究多元Ti(CN)膜层 ,用空心阴极离子镀方法 ,通入不同比例C2 H2 和N2 反应气体 ,以研究反应气体流量变化对膜层性能的影响 ,筛选出C2 H2 与N2 的最佳比例 ,确定镀膜的最佳工艺参数 ,并对最佳工艺条件下的膜层进行了硬度和膜基结合力等的测试 ,用X衍射仪、电镜、金相显微镜等对膜层的微观组织结构进行了分析 .结果表明 :镀膜工艺可行 ,膜层性能优异 ,膜基结合好 。

Using the N2, C2H2 as the reactive gases, the films are deposited on high speed steel (HSS). The influence of the change of the reactive gases flow on the film's properties was studied. By valuing the film's properties, the optimum ratio between C2H2 and N2 was found. And the optimum technology parameters for ion plating were also obtained. The results show that plating procedure is feasible; the properties of the films are excellent; the adhesion strength between the film and the substrate is good. X-ray diffraction (XRD) and metallography were used to analyze the film, which provides experimental and theoretical evidence for the application of the Ti(CN) film in practice.