摘要
提出了一种新型稀硫酸退铬工艺。探讨了其作用机理 ,分析了硫酸、添加剂。
A new stripping process of chromium electrodeposit in dilute sulfuric acid solution was advanced. Action mechanism of the process was investigated. Effect of sulfuric acid, additive, temperature and current density on stripping rate of chromium electrodeposit was discussed.
出处
《电镀与涂饰》
CAS
CSCD
2002年第2期13-14,共2页
Electroplating & Finishing