摘要
利用介质阻挡放电 ,进行了常压非平衡等离子体渗氮 ,着重讨论了有关工艺参数的影响情况。正交试验结果表明 ,合理选择放电电压、放电间距和渗氮温度是获得良好渗氮层的关键。在本工艺条件下 ,适当减小放电间隙 ,增大电场强度 。
Nonequilibrium Plasma nitriding at atmosphere pressure was carried out through dielectric barrier discharge (DBD). Effects of technology parameters were discussed. Orthogonal experimental results showed that the key for obtaining good nitriding layer was to choose the discharge voltage, discharge interval and nitriding temperature properly. Reducing discharge interval and increasing electric field intensity could increase the hardness and depth of nitriding layer markedly.
出处
《材料保护》
CAS
CSCD
北大核心
2002年第4期34-37,共4页
Materials Protection
基金
国家自然科学基金 (6 0 0 310 0 1子课题 )
交通部通达计划 (95 0 6 0 2 0 2 )资助
