摘要
研究设计了一种网状阴极溅射靶 ,它是由多个空心阴极并列交叉组合而成。结构简单 ,溅射率高。将其用于双层辉光离子渗钽中 ,在钛合金TC4(Ti 6Al 4V)表面可形成纯Ta沉积层和合金扩散层的复合层组织 ,进一步提高了钛合金的耐蚀性 。
A new net\|shape cathode sputtering target which has a simple structure and a high sputtering was put forward. The multiple\|structure of alloying and coating layers of tantalum was achieved on the surface of TC4 by double glow surface alloying process. The tantalized samples were investigated by SEM, XRD and electrochemical corrosion method.
出处
《材料热处理学报》
EI
CAS
CSCD
北大核心
2002年第1期54-56,共3页
Transactions of Materials and Heat Treatment
基金
山西省自然科学基金项目 (2 0 0 0 1 0 4 3)
山西省青年科学基金项目 (991 0 2 0 )
