等离子体浸没式离子注入圆形薄片均匀性研究

Dose uniformity study with PIC method in plasma immersion ion implantation of circular plate

采用PIC(Particalincall)方法考察了等离子体浸没式离子注入工艺中,样品和靶台的几何尺寸、形状及防止溅射沾污的绝缘材料对于注入离子径向分布的影响。并对模拟结果进行了讨论分析。结果表明,影响剂量分布的主要因素是基片和靶台的横向尺寸,为改善等离子体浸没式离子注入均匀性的研究提供参考数据。

PIC method was used to study the dose uniformity in plasma immersion ion implantation of circular plate. The results of simulations show that the lateral length of the plate is the main factor that affects the dose uniformity, and the other factors, like the depth, the shape of the boundary, and the insulator shroud, only have weak effects on the dose uniformity.