摘要
使用含硅合金熔体对 Ti Al基合金进行了表面渗硅处理 ,渗硅处理温度范围是 :913~ 10 5 3K。实验发现 ,Ti Al基合金与 Al- Si熔体之间发生了界面反应 ,界面生成以 Si,Ti,Al三元素为主的灰白色基体和条状、小块状黑色相。表面处理后样品经 1173K/ 10 0 h高温氧化后 ,表层形成了 Al2 O3、Si O2 等致密的氧化膜 ,并保留有稳定的 Si- Ti- Al相 ,因而改善了表面氧化层结构 ,大大增强了 Ti
Siniconizing treatment on surface of TiAl based alloy was conducted by Al Si molten alloy within the temperature range from 913K to 1053K Due to the surface modification, interfacial reactions occured between the TiAl based alloy and the Al Si molten alloy, resulted in the formation of gray martrix and black phases of tiny block or strip composed of elements of Si, Ti and Al It was found that, after oxidation at 1173K for 100 hours, thin oxide film of Al 2O 3 and SiO 2, as well as the stable Si Ti Al phases were formed on the surface of siniconized TiAl based alloy There, oxidation resistance of the TiAl based alloy was greatly improved
出处
《材料工程》
EI
CAS
CSCD
北大核心
2002年第3期17-19,共3页
Journal of Materials Engineering
基金
航空科学基金资助 (99G2 10 13 )