采用俄歇电子能谱技术分析铂化硅的合金行为

Study on alloying behaviour of platinum silicide with AES

采用俄歇能谱技术分析了铂层厚度,合金温度及表面染色对铂化硅形成的影响,并分析了王水对铂化硅的作用,给出了分析结果。

In this paper , the influences of various parameters , such as Pt thickness alloyingtemperature and surface dyeing , on forming platinum silicide and the action of aqua regia on Ptsilicide were analyzed with AES. The result is given .