射频反应溅射氧化铌薄膜的电致变色性能研究

Electrochromic Properties of Niobium Oxide Thin Films Fabricated byRF Sputtering

采用射频反应溅射法成功地制备了非晶态氧化铌薄膜,研究了它们的电致变色性能.这些薄膜在漂白态透明无色,而着色态则为灰褐色.循环伏安测试结果表明该薄膜具有良好的稳定性和很好的锂离子注入/抽出性能.550nm处的着色效率为16.68cm2/C,在可见光区透过率调制幅度为20%～30%.结合X光电子能谱(XPS)分析可以认为氧化铌薄膜的电致变色现象是由于锂离子和电子的共同注入与抽出,导致薄膜中的铌离子发生Nbv和NbIV间的可逆氧化、还原反应引起的.

Electrochromic Nb2O5 films were prepared successfully by RF sputtering process. These films are transparent in bleached state and brownish gray in colored state. Cyclic voltammetry (CV) measurement results show that the film has good stability, high reversibility of Li+ insertion/extraction. The coloration efficiency is 16.68cm(2)/C at 550nm. The difference of transmittance between bleached and colered states is 20%similar to30% in visible range. XPS results show that the electrochromic properties of the Nb2O5 film can be attributed to the reversible redox reaction between Nb-V and Nb-IV with the double injection/extraction of Li+ and e(-), which can be described as: (Nb2O5 double right arrow(xLi++xe-))-O-V (LixNbxNb2-xO5 double left right arrow(yLi++ye-))-Nb-IV-O-V (Lix-yNbx-yNb2-(x-y)O5)-Nb-IV-O-V (xgreater than or equal toy).