摘要
电子束图形分割程序FDEB将CAD系统产生的原始图形分割成不相交的几种基本图形,以适应电子束曝光机制作细线条IC版的需要。本文介绍了图形分割的主要算法以及场划分和曝光路径优化的方法。
The E-Beam pattern dividing Program FDEB is used in E-Beam exposure machine.With the FDEB program,the original patterns produced by CAD system can be divided into several kinds of basic patterns without overlays which are available for the need fabricating the IC mask with fine lines by E-Be am exposure system.This article introduces the main calculaton method of pattern dividing and it also presents the optimum methods of field dividing and exposure path.
出处
《微细加工技术》
1991年第2期25-29,共5页
Microfabrication Technology
