TiO_2薄膜光催化剂的制备及其活性

Preparation of TiO_2 photocatalytic film and its photoactivity

用活化反应蒸发技术制备了不同附载条件的TiO2 薄膜光催化剂 ,膜厚度在 0 5 μm— 1 2 μm之间 ,经 4 0 0℃退火后用XRD测定其晶型结构 ,发现无定型TiO2 已部分转变为锐钛矿型 .薄膜光催化剂连续使用两次活性会下降 ,用HCl冲洗活性即可恢复 .考察了不同波长的电光源和不同辐射强度的太阳光下两种催化剂薄膜的活性比较 ,结果发现短波长电光源下(2 5 4nm)膜厚度以 0 5 μm最佳 ,而强烈辐射的太阳光下膜厚度以 1 2

The TiO 2 photocatalytic films were prepared by active reactive evaporation processing. After 400℃ annealing in the air the main crystal of the TiO 2 on the film is anatase. The photoactivity of the film was evaluated by decoloration of methylene blue and reactive brilliant red K 2G respectively. Photoactivity of the film was regenerated by HCl rinsing after the film was used for several times. We also evaluated the photoactivity of the film under different wavelength of electric light sources and different irradiations of sun light, and found that for short wavelength (254?nm) the best thickness of the film is 0 5?μm but for sun light is 1 5?μm.