摘要
自从七十年代末开始 ,在玻璃基底上沉积光学薄膜的真空镀膜进入了一个稳定的增长期 ,近几年低辐射(LOW E)镀膜层的结构逐渐成为一个研究热点。本文就低辐射镀膜层的理论光学特性的计算机辅助模拟 (CAS)进行了探讨。在可见光和红外区范围内进行的光学测量显示了理论计算与实验结果的不同之处。
Vaccum film plating for depositing optical film on glass base has been entering into a stable increasing stage since 1970 While the structure of low E plating film layer has become the hot spot of studies recent years CAS for theoretical optical performance of low E plated film layer is discussed The optical measurement made in visible and infrared area shows the difference between theoretical calculations and the experimental results
出处
《金属功能材料》
CAS
2002年第2期21-25,共5页
Metallic Functional Materials
