非晶态FeBSi/Si成份调制膜的磁性质和内转换电子Massbauer谱

MAGNETIC PROPERTIES AND CONVERSION ELECTRON MSSBAUER SPECTROSCOPY OF COMPOSITIONALLY MODULATED FeBSi/Si AMORPHOUS FILMS

采用高频溅射法成功地制成了非晶态FeBSi/Si成分调制膜,随Si层厚度增加,调制膜的饱和磁化强度成指数下降,这是死层效应引起的,Mossbauer谱测量表明,死层是由于界面处Fe和Si原子的互扩散而形成的顺磁性相,在非晶态FeBSi/Si成分调制膜中发现存在尺寸效应,它只与FeBSi层的厚度有关,而死层效应既与FeBSi层厚度有关,也与Si层厚度有关。

The compositionally modulated FeBSi/Si amorphous films were prepared by rf sputtering. The saturation magnetization of modulated films decreases exponentially with increase of the thickness of Si layers. This is caused by the dead layers. The Mossbauer spectra measurements showed that the dead layers are the paramagnetic phase formed by the interdiffusion of Fe and Si atoms at the interfaces. The size effect was observed in the FcBSi/Si films. The size effect depends only on the thickness of FeBSi layers, and the dead layer effect depends on both the FeBSi layer thickness and Si layer thickness.