离子轰击引起的表面形貌对Ag的溅射产额的影响

INFLUENCE OF SURFACE TOPOGRAPHY ON THE SPUTTE RING YIELDS OF SILVER

用捕获膜技术和卢瑟福背散射(RBS)谱仪测定Ag靶在27keV Ar^+离子轰击下的溅射原子角分布,从而确定不同剂量下Ag的溅射产额,并对其靶点表面形貌进行扫描电子显微镜(SEM)观察。结果发现,所有的角分布都呈over-cosine形状,但其溅射产额却随着表面形貌不同而不同。根据溅射产额Y与轰击离子入射角φ变化关系,讨论不同轰击剂量下溅射产额的差别,肯定了表面形貌是影响溅射产额的一个重要因素,并由此提出“表观产额”的新概念。

The angular distributions and yields of silver atoms sputtered from a Ag sample have been measured using collector technique and RBS analysis. The Ag target was sputtered at normal incidence with 27keV Ar+ ions. The irradiated surface was examined by scanning electron microscopy. It was found that all the angular distributions were over-cosine with different irradiation dose, but the sputtering yields were dose-dependent. The experimental result can be explained with surface topography and sputtering yield as a fuction of the angle of incidence. It is found that surface topography seems to be an important factor to influence sputtering yield. a new concept, namely 'apparent yield', is presented.