摘要
论述了在接触显微成像技术中 ,后续放大设备对分辨率的影响 ,并用实验方法比较了采用光学显微镜和原子力显微镜阅读并放大显微图的结果 。
The instruments for reading relief in the photoresist related with the resolutions of soft X-ray contact microimaging are described. Comparing the micrographs made by an atomic force microscope with that by optical microscopes experimentally, the conclusion can be drawn that the atomic force microscope is a very good method for amplifying the images in the resists.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2002年第1期118-120,共3页
Acta Optica Sinica
基金
国家自然科学基金 (196 5 5 0 0 1)
合肥国家同步辐射实验室开放基金资助课题
