摘要
GaNAs alloy is grown by metalorganic chemical vapor deposition (MOCVD) using dimethylhydrazine (DMHy) as the nitrogen precursor.High resolution X ray diffraction (HRXRD) and secondary ion mass spectro metry (SIMS) are combined in determining the nitrogen contents in the samples.Room temperature photoluminescence (RTPL) measurement is also used in characterizing.The influence of different Ga precursors on GaNAs quality is investigated.Samples grown with triethylgallium (TEGa) have better qualities and less impurity contamination than those with trimethylgallium (TMGa).Nitrogen content of 5 688% is achieved with TEGa.The peak wavelength in RTPL measurement is measured to be 1278 5nm.
采用 MOCVD方法 ,利用二甲基肼为氮源 ,进行了 Ga NAs材料的生长 .利用高分辨 X射线衍射与二次离子质谱测试方法确定了材料中氮的组分 .采用室温光致发光谱测量了样品的光学性质 .讨论了不同的镓源对 Ga NAs材料质量和其中的杂质含量的影响 ,结果证明三乙基镓在 Ga NAs的低温生长中比三甲基镓具有更大的优势 .采用三乙基镓生长的 Ga NAs中氮的含量达到 5 .6 88% .光致发光谱的峰值波长为 12 78.5
