摘要
阐述了可实现 0 1μm线宽器件加工的几种候选光刻技术 ,对 193nm(ArF)准分子激光光刻技术作了较为详细的论述 ,指出其在 0 1μm技术段的重要作用 ,并提出了研制 193nm(ArF)光刻设备的一些设想。
In this paper,I discuss several lithography which can achieve 0.1 μm node.Then I detailedly discuss 193 nm(ArF)lithography and point out its importance.Finally,I show some plans about 193 nm(ArF)lithography.
出处
《电子工业专用设备》
2002年第1期27-31,共5页
Equipment for Electronic Products Manufacturing
关键词
光学光刻
光刻设备
193nm光刻
Optical lithography
Lithographic equipment
193 nm lithography