摘要
采用直流反应磁控溅射法在玻璃基片上制备了 Ti O2 薄膜。靶材为纯度 99.9%的钛靶 ,溅射时基片不加热。XRD结果显示 ,所得 Ti O2 薄膜的晶型为锐钛矿相 ;SEM结果显示 ,随着热处理温度的增加 Ti O2 薄膜晶粒尺寸增大 ;光催化性能显示 ,经过 5 0 0℃热处理 1h后的 Ti O2
Titanium oxide thin films were deposited by the d.c. reactive magnetron sputtering method from a pure 99.9% Ti disk. During the sputtering process the substrates was not heated. The results of scanning electron microscopy showed that the crystalline size of this film increased and the XRD figure showed the film remained complete anatase phase after being annealed to 500 ℃ in air for an hour. The structure variations result in the variations in the optical properties. The films deposited by an appropriate sputtering pressure show better photocatalytics after ultra violet radiation.
出处
《武汉理工大学学报》
CAS
CSCD
2002年第6期1-3,共3页
Journal of Wuhan University of Technology
基金
湖北省自然科学基金资助 (2 0 0 1ABB0 77)
关键词
TiO薄膜
磁控溅射
光催化
溅射气压
TiO 2 thin film
magnetron sputtering
photocatalytic activity
sputtering pressure
