Mo_2C过渡层对金刚石-碳膜场发射均匀性的影响

EFFECT OF Mo_2C INTERMEDIATE LAYER ON ELECTRON FIELD EMISSION UNIFORMITY OF DIAMOND-CARBON FILMS

在经过不同特殊预处理的金属钼衬底上沉积了金刚石 -碳膜 ,分别用X射线衍射谱 (XRD)、拉曼光谱 (Raman)和扫描电子显微镜 (SEM)对样品进行了分析和测试 ,并研究了样品器件的场发射特性。结果发现在金属钼衬底和金刚石 -碳膜之间形成的Mo2 C过渡层与金刚石

The diamond -carbon films were deposited on metal Mo substrates by using microwave chemical vapor deposition(CVD)technique (Mo substrates were pretreated by special techniques).The films were characterized by X-ray diffraction(XRD),Raman spectrum and scanning electron microscopy(SEM).The result of the experiments indicates that the Mo 2C interfacial layers formed between Mo substrate and the diamond-carbon films.The study demonstrated a strong correlation between the field emission uniformity and the Mo 2C interfacial layer.