摘要
利用介孔分子筛MCM 4 1内孔壁表面的硅羟基 ,成功地将酰胺基团嫁接到介孔材料的孔壁上 ,并通过该官能团与铜离子形成配位键 ,合成了Cu(Ⅱ )复合物修饰的MCM 4 1新材料 .通过XRD、BET、SEM EDX、ICP和TG等手段对该杂化材料进行了表征 .结果表明 ,修饰过的MCM 4 1的有序度降低 ,比表面积和孔容都有所下降 ;而铜离子均匀分布在有机
By using the silica hydroxyl group on the surface of inner hole wall of mesoporous sieve MCM 41,the amide group has been successfully grafted to the hole wall of the mesoporous material. Througth the formation of a ligand bond between this functional group and copper ion,a Cu(Ⅱ) complex modified MCM 41 material has been synthesized. Combined techniques of nitrogen adsorption desorption isotherms,scan electron microscopy (SEM) and energy dispersive X ray analysis (EDX),powder X ray diffraction (XRD),thermalgravimetric (TG),element analysis and ICP were used to characterize the samples. The results show that the ordering of the modified MCM 41 decreases,its surface area and pore volume decreases as well; but copper ions distribute uniformaly in the organic inorganic hybrid material.
出处
《复旦学报(自然科学版)》
CAS
CSCD
北大核心
2002年第3期320-324,共5页
Journal of Fudan University:Natural Science
基金
国家自然科学基金资助项目 (2 98730 10 )
上海市科技发展基金资助项目 (0 112NM 0 76 )