水基光敏树脂的合成

Synthesis of water-based photosensitive resin

以还氧树脂、丙烯酸、马来酸酐为原料 ,研究了原料投料比、反应温度、催化剂、溶剂等因素对合成水基光敏树脂性能的影响。当丙烯酸酸当量 /还氧当量 =1 0 0∶1 0 5,马来酸酐酸酐当量 /还氧当量 =1 0 0∶1 0 5,催化剂用四甲基氯化铵 ,酸改性溶剂为丙酮 ,反应温度为 80± 2℃ ,反应时间为 2 5h情况下 ,合成的水基光敏树脂水溶性较好 ,以其配制的水性涂料 ,含水在 1 0 %～ 2 0 % (质量分数 )时 ,涂料的涂布性能好 ,固化速度快 (2～ 3s)。

Effects of raw material ratio, reaction temperature, catalyzer and solvent on properties of water-based photosensitive resin which is synthesized with epoxy resin, acrylic acid, malei anhydride as raw materials were studied. Water-solubility of the synthesis resin was optimized when synthesis reaction condition was below ratio of acrylic acid equivalent to epoxide equivalent as 1 00∶1 05, tetramethyl-ammonia chloride was used as catalyzer, and acetone as solvent at the temperature of 80±2℃ with reaction time of 2 hours. With water content of 10%～20% (wt), water based coating formulated with the above synthesis resin has good coating properties and fast curing rate.