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灰度掩模并行激光直写系统的总体设计 被引量：4

General Design of Parallel Laser Direct Writing System for Manufacturing Gray-scale Masks
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摘要 灰度掩模法是一种新的二元光学器件制做方法。研究了并行激光直写高性能灰度掩模的工作原理 ,对空间光调制器 (SML )、精缩投影物镜和二维气浮平台等关键单元进行了分析 ,给出了并行激光直写系统的主要技术指标和初步实验结果。 Gray-scale mask method is a novel way of fabricating binary optical elements. In this paper, the working principle about parallel laser direct writing gray-scale masks of high quality was analyzed. In the parallel laser direct writing system, some crucial units such as spatial light modulator (SLM), projection objective and two-dimensional air-bearing stage were studied in detail. Then its main technical indexes and initial experimental results were provided.
作者 颜树华 戴一帆 吕海宝 李圣怡
机构地区 国防科技大学机电工程与自动化学院
出处 《光电子．激光》 EI CAS CSCD 北大核心 2002年第6期559-562,共4页 Journal of Optoelectronics·Laser
基金 国家自然科学基金资助项目 (5 0 0 0 5 0 2 2
关键词 二元光学 并行激光直写 灰度掩模 空间光调制器 设计 Experiments Light modulators Optical devices
分类号 TN305.7 [电子电信—物理电子学]
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参考文献3

二级参考文献11

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共引文献14

同被引文献25

  • 1巴音贺希格,高键翔,齐向东,李春启.10.6μm激光器一级输出高衍射效率闪耀光栅的研制[J].光电子．激光,2004,15(10):1137-1140. 被引量：18
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光电子．激光
2002年 第6期

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