RF-HFCVD生长高质量纳米金刚石薄膜

HIGH QUALITY NANOCRYSTALLINE DIAMOND FILMS GROWN BY RF-HFCVD

采用射频等离子体增强的热丝化学气相沉积 (RF HFCVD)技术在石英玻璃衬底上制备了高质量的纳米金刚石薄膜 .研究了衬底温度、反应气压及射频功率对金刚石膜的结晶习性和光学性质的影响 ,其最佳值分别为70 0℃、2× 133Pa和 2 0 0W .在该条件下金刚石成核密度达 10 11cm-2 ,经 1h生长即获得连续薄膜 ,其平均晶粒尺寸为 2 5nm ,表面粗糙度仅为 5 5 ,在近红外区域 (80 0nm处 )的光透过率达 90 % .

High quality diamond films were successfully prerared on quartz via the radio-frequency plasma enhanced hot filament chemical vapor deposition (RF-HFCVD) process. The effects of substrate temperature, reaction gas pressure and RF power on the structural and optical properties of prepared films were studied. The results show that their optimal values are 700degreesC, 2 x 133Pa and 200W, respectively. Under the optimal deposition parameters, the achieved diamond nucleation density can be as high as 10(11)cm(-2), and after growth for 1 h, nanocrystalline diamond film can always be obtained with its grain size of about 25nm, its average surface roughness of about 55Angstrom, and its optical transmission of 90% in the infrared region(800nm).