聚二甲基硅氧烷微流控芯片的紫外光照射表面处理研究

Surface Modification of Poly(dimethylsiloxane)-fabricated Microfluidic Chip by UV Radiation

研究了紫外光化学表面改性对聚二甲基硅氧烷 (PDMS)微流控芯片的片基间粘接力及毛细管通道电渗流性能的影响 .PDMS片基经紫外光射照后 ,粘接力增强 ,可实现 PDMS芯片的永久性封合 ,同时亲水性得到改善 ,通道中的电渗流增大 .与文献报道的等离子体表面处理方法比较 ,采用紫外光表面处理 ,设备简单 ,操作方便 ,耗费少 ,是一种简单易行的聚二甲基硅氧烷芯片表面处理方法 .

UV radiation was applied to modify the surface of poly(dimethylsiloxane)(PDMS) fabricated microfluidic replica. After the surface of PDMS was irradiated by a 6 W low pressure mercury lamp, the adhesion between PDMS plates was significantly strengthened, and the PDMS plates were irreversibly sealed when the irradiated surfaces were brought into contact. Hydrophilic behavior of PDMS replica was improved due to the photochemical reaction induced by UV radiation, resulting in a significant increase in the electroosmotic flow of buffers filled in the microchannels of the chip. Compared with the reported procedures using oxygen plasma pretreatment, the present approach allows one to easily modify the surface of PDMS plates using very simple and cheap equipment available in analytical laboratory.