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GaN_(1-x)P_x三元合金的MOCVD生长 被引量:1

GaN_(1-x)P_xTernary Alloy Grown by Metal-Organic Chemical Vapor Deposition
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摘要 用金属有机化学气相淀积技术在蓝宝石衬底上成功外延了高P组分的GaN1-xPx 三元合金 .俄歇电子能谱深度剖面结果表明在GaN1-xPx 中P的掺入量最高达到 2 0 %且分布均匀 ;X射线光电子能谱价态分析证实了外延层中Ga—P键的存在 .对不同P组分的GaN1-xPx 样品进行了低温光致发光 (PL)测试 ,与来自GaN衬底的带边发射相比 ,随三元合金中P组分的变化 ,GaN1-xPx 的PL峰呈现出了不同程度的红移 .在GaN1-xPx 的PL谱中没有观测到有关GaP的发射峰 ,表明该合金材料没有发生相分离 . GaN 1-x P x ternary alloys with large composition ratios are successfully grown by means of metal organic chemical vapor deposition.Depth profiles of the elements in GaN 1-x P x layers show that a maximum P composition ratio is up to 20% and the P atoms are distributed uniformly in the GaN 1-x P x films.Examinations of the chemical states between P and Ga demonstrate the presence of Ga-P bond using X ray photoelectron spectroscopy in GaN 1-x P x layer.Photoluminescence spectra for GaN 1-x P x layers with P composition ratios of 11%,15% and 20% show the redshifts of 77,100 and 87meV,respectively,from that of GaN.No peak related to GaP is observed,indicating that the phase separation between GaN and GaP does not occur in the GaN 1-x P x alloys.Key words:GaN 1-x P x ;MOCVD;chemical state;redshift phase interface, and the orientation relationship between Al 3Ti and α (Al) is (006) Al 3Ti ∥ (02-2) Al , -22] Al 3Ti ∥ Al 3Ti ∥-0] Al . The strengthening mechanisms of Al 3Ti/ZL101 in situ composite is proved to be caused by fine grain size, spreading distribution and dislocation multiplication. Al . The strengthening mechanisms of Al 3Ti/ZL101 in situ composite is proved to be caused by fine grain size, spreading distribution and dislocation multiplication.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第7期782-784,共3页 半导体学报(英文版)
基金 国家重点基础研究专项 (编号 :G2 0 0 0 0 6 83) 国家自然科学基金 (批准号 :6 0 136 0 2 0 6 9976 0 14 6 99870 0 1) 国家高技术研究发展计划资助项目~~
关键词 三元合金 MOCVD 化学态 红移 镓氮磷合金 气相沉积 in situ composite microstructure mechanical properties reinforcement mechanism
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参考文献6

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同被引文献9

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  • 4[4]Seong T Y,Bae I T,Choi C J,et al.Microstrutures ofGaN1-x-Px layers grown on (0001) GaN substrates by gas source molecular beam epitaxy.J Appl Phys,1999,85(6):3192
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  • 6[7]Lu W,Ye H J,Yu Z Y,et al.Far infrared quasi-local modes of ZnTe in CdTe.Solid State Commun,1987,64:1167
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  • 9[10]Yu G,Ishikawa H,Umeno M,et al.The infrared optical functions of AlxGa1-xN determined by reflectance spectroscopy.Appl Phys Lett,1998,73:1472

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