期刊文献+

微机械薄膜应力的在线测试结构 被引量:4

In-Situ Test Structures of Micromachined Thin Films
下载PDF
导出
摘要 微机械薄膜应力对MEMS器件有较大的影响 ,因此应力测量对于工艺监控和MEMS器件设计是必须的。介绍了微机械薄膜应力的在线测试结构与方法 ,详细分析了各种方法的特点。 Internal stresses in micromachined thin films have a great influence on the properties of MEMS devices.Measurement of stresses in the films is critical for process monitoring and MEMS design.In situ test structures and methods for the films are introduced.Comparison of various methods is given,which is valuable to the design of the MEMS test structures.
出处 《测控技术》 CSCD 2002年第7期6-9,共4页 Measurement & Control Technology
关键词 微机械薄膜应力 在线测试结构 半导体加工 MEMS器件 微电子技术 in stiu stress micromachine film test
  • 相关文献

参考文献9

  • 1[1]Van Drieenhuizen B P,Goosen J F L,French P J,Wolffenbuttel R F.Comparison of techniques for measuring both compressive and tensile stress in thin films[J].Sensors and Actuators A,1993,37-38:756-765.
  • 2[2]Mark G A,Mehran M,Roger T H,Stephen D S.Microfabricated structures for the in situ measurement of residual stress,Young's modulus,and ultimate strain of thin films[J].Appl.Phys.Lett,1978,51(4):241-243.
  • 3[3]Elbrecht L,Storm U,Catanescu R,Binder J.Comparison of stress measurement techniques in surface micromachining[J].Micromech,Microeng,1997,7:151-154.
  • 4[4]Zhang Xin,Zhang Tong-Yi,Zohar Yitshak.Measurements of residual stresses in thin films using micro-rotating-structures[J].Thin Solid Films.1998,335(1-2):97-105.
  • 5[5]Ericson Fredric,Greek Staffan,Soderkvist J,Schweitz J A.High-sensitivity surface micromachined structures for internal stress and stress gradient evaluation[J].Micromech.Microeng,1997,7:30-36.
  • 6[6]Schweitz J ,Ericson F.Evaluation of mechanical materals properties by means of surface micromachined structures[J].Sensors and Actuators,1999,74(1-3):126-133.
  • 7[7]Lin L L,Howe R T,Pisano P P.A Passive, In Situ Micro Strain Gauge[A].MEMS '93, Proceedings An Investigation of Micro Structures,Sensors,Actuators,Machines and Systems.IEEE.1993:201-206.
  • 8[8]Chi Hsing Pan,Wensyang Hsu.A Microstructure for in situ Determination of Residual Strain[J].Microelectromechanical systems,1999,8(2):200-207.
  • 9[9]Gianchandani Y B,Najafi K.Bent-beam strain sensors[J].Microelectromechanical System.1996,5(1):52-58.

同被引文献27

  • 1聂萌,黄庆安,李伟华.MEMS多层膜残余应力全场光学在线测试[J].Journal of Semiconductors,2005,26(5):1028-1032. 被引量:5
  • 2陈焘,罗崇泰.薄膜应力的研究进展[J].真空与低温,2006,12(2):68-74. 被引量:32
  • 3吴平,邱宏,姜德怀,张蓓,陈森,赵雪丹,黄筱玲.用干涉方法测量薄膜应力[J].物理实验,2006,26(9):7-9. 被引量:6
  • 4王丽蕊.PVC镀铝膜铝层牢固度的研究[J].现代塑料加工应用,2007,19(1):29-31. 被引量:5
  • 5Van Drieenhuizen B P, Goosen J F L, French P J, et al. Comparison of techniques for measuring both compressive and tensile stress in thin films. Sensors and Actuators A, 1993,37/ 38:756
  • 6Zhang X, Zhang T Y, Zohar Y. Measurements of residual stresses in thin films using micro-rotating structures. Thin Solid Films, 1998,335: 97
  • 7Roark R J, Young W C. Formulas for stress and strain. New York: McGraw-Hill, 1975
  • 8Elbrecht L,Storm U,Catanescu R,et al. Comparison of stress measurement techniques in surface micromaching. Journal of Micromechanics and Microengineering, 1997,7:151
  • 9Kim C J, Muller R S, Pisano A P. Residual strain measurement of thin films using microfabricated vernier gauges. Sensors and Materials, 1993,4 (4): 291
  • 10Benrakkad M S,Benitez M A,Esteve J,et al.Stress measurement by micro Raman spectroscopy of polycrystalline silicon structures.J Micromech Microeng,1995,5:132

引证文献4

二级引证文献11

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部