OMR-85光刻胶的研究与应用

Study and Application of OMR85 Phtot Resist

在半导体制造中 ,光刻胶是重要的原材料之一。本文从转速与膜厚、感光灵敏度、图形变化差等方面对ORM 85光刻胶进行了研究 ,得出了用于大生产的一套工艺。解决了接触式曝光方式粘版的问题及提高了产能。

Photoresist is one the most important material in wafer Fab.In this paper,OMR85 photoresist will be studied by studying its filmthickness.Sensitivity and linearity ect.It comes up a type of process which can be used in wass productin.A solution is submitted for the fact of attaching to mask when cointact exposure.And the throughput is improved.