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光致抗蚀剂曝光的虚膜插入模拟技术 被引量:1

Simulating Technique with Virtual Film Inserting for Photoresist Exposure
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摘要 提出了在各膜层之间插入虚膜的计算方法 ,导出了相应的光学薄膜传输矩阵 .该方法使得膜与膜之间解耦 ,并便于在计算机上存储和计算薄膜的反射率、透射率以及能流密度 .对抗蚀剂曝光的计算结果表明这种技术是有效的 . Computing method with inserting zero-thickness film into arbitrary two films is proposed,and the corresponding optical film transmission matrixes are deduced.The method decouples the correlation between films,facilitates the storage in computers and the calculation of the reflectivity,transmittivity and energy flow density. The calculating result to photoresist exposure indicates the computing technique is feasible.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第8期886-891,共6页 半导体学报(英文版)
基金 国家自然科学基金资助项目 (批准号 :6 0 0 2 5 10 1)~~
关键词 虚膜插入模拟技术 光学传输矩阵 抗蚀剂曝光 光学薄膜计算 集成电路 曝光技术 optical transmission matrix photoresist exposure optical film calculating
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  • 1唐雄贵,郭永康,杜惊雷,刘世杰,高福华.基于角谱理论的厚层光刻胶衍射光场研究[J].光学学报,2004,24(12):1691-1696. 被引量:8
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