磁控溅射沉积U薄膜性能研究

Study on Properties of U Films Prepared by Magnetron Sputtering

采用X射线光电子能谱仪 (XPS)和扫描透射电镜 (STEM )分析了在Al薄膜基材上磁控溅射沉积U薄膜的表面形貌、组织和结构 ;分别采用排代法、霍美尔 (T2 0S)粗糙度测量仪测量了薄膜的密度和表面粗糙度。结果表明 :溅射沉积的U薄膜由金属U和少量UO2 组成 ,薄膜结构属微晶和无定形态 ,密度是块材密度的 (75± 5 ) % ,表面粗糙度小于 0 3 μm。

Surface morphology and microstructure of U films prepared by magnetron sputtering deposition are investigated with X ray photoelectron spectroscopy(XPS) and scanning transmission electron microscopy(STEM). Density and surface coarse of U films have been measured by displacement method and Houmeier(HME) instrument. The results indicate that U films prepared by magnetron sputtering deposition are partial in an oxidized states, the metallic nature of the films is reflected in a U4f spectrum. Microstructure of U films is composed of dense micro crystal islands or amorphous layer. Density and surface coarse of U films are about 14 g/cm 3 and 0.2 μm, respectively.