摘要
本文叙述了对多弧离子镀膜机阴极弧源所做的实验研究,提出了如何降低靶极工作电流、提高靶材利用率、减小蒸发粒子的颗粒度以及提高成膜质量的方法。详细介绍了在我所研制的HLZ-750型八个弧源的多弧离子镀膜机上所做的 TiN超硬涂层及装饰涂层的工艺研究及实测结果。
In this paper,the experiment and study on the cathode arc source of multiarc ion coater are described,the methods how to drop down the operation current of target, enhance the utilization of target material, decrease the size of the vapourized particle and enhance the film quality are given.The process experiment and actual results on the TiN ultra-hard film and decorative film produced by multi-arc ion coater with 8 arc sources HLZ-750 mades in our institute are introduced in detail here.
出处
《真空》
CAS
北大核心
1991年第1期9-15,共7页
Vacuum