摘要
本文介绍对向平面双阴极磁控溅射装置,同时作为一种制取超硬涂层的新方法,TIN涂层的工艺亦在本文中作了讨论.
The equipment of magnetron sputtering with opposite double plane cathodes is introduced in this paper.As a new method for producing the super-hardness coated layer,the process of TiN layer is also discussed here.
出处
《真空》
CAS
北大核心
1991年第1期27-31,共5页
Vacuum