磁控反应溅射制备大面积掺锡氧化铟薄膜工艺探讨

Research for Technique of Large-area Indium-Tin Oxide Film by Magnetron Reactive Sputtering Method

本文主要介绍磁控反应溅射制备大面积 ＩＴＯ薄膜（掺锡氧化铟透明导电薄膜）的导电原理、成膜过程、工艺参数的选择以及不同工艺参数对产品性能的影响。实验结果表明：选择各种合理的工艺参数能够获得不同产品需要的ＩＴＯ薄膜。

In this paper, the coating forming process of ITO (Indium-Tin Oxide) film by magnetron reactive sputtering method, electroconductive principle, the choices of technical parameters and the influence of different parameters on the performance of the products are mainly described.The results of the experiment indicate:the choices of various resonable parameters can obtain ITO films which meet different requirements.