摘要
利用自制的ＥＣＲ（电子回旋共振）微波等离子体溅射沉积装置，在氮气分压很低的条件下（２．６× １０－３～２．９ × １０－２Ｐａ）成功地获得了透明绝缘的纯氨化铝膜。电阻率达１０１１ ·ｃｍ，折射率约为 ２．０５，膜的其他各项物理性能均达到了较好的指标．
By use of the ECR microwave plasma sputtering deposition apparatus, pure and transparant AIN film have been produced at the very low partial pressure of Nitrogen gas (2.6×10-3~2.9× 10-2Pa). The electrical resistivity and the refrative index are about 1011 .Cm and 2.05 respectively. All the other physical properties of the film reach the good level. correspondent: Li Qi, Liaoning University, Shenyang 110036
出处
《真空》
CAS
北大核心
1991年第2期36-41,共6页
Vacuum
