离子源的溅射特性及其对ZnS薄膜折射率的影响

Study on sputter property and effect of ion source on refractive index of ZnS film

在离子束辅助镀膜工艺中 ,离子源工作参数无疑是影响薄膜质量的关键因素 .本文对宽束冷阴极离子源溅射特性进行了研究 ,给出了离子源引出电压与溅射速率的关系 .

In the process of ion beam assisted deposition (IAD), it is important to select the proper parameters of ion source. The authors researched the sputter property of broad beam cold cathode ion source, found out the influence of extracting voltage of ion source on sputter velocity, and discussed the relationship between ion intensity and refractive index of ZnS film in this paper.