石英衬底上生长的高光学质量的纳米金刚石薄膜

Highly transparent nanocrystalline diamond films on quartz substrates

采用射频等离子体增强的热丝化学气相沉积 (RF HFCVD)技术在石英玻璃衬底上制备了表面光滑、晶粒致密均匀的纳米金刚石薄膜 .用扫描电子显微镜 (SEM)和台阶仪观测薄膜的表面形貌和粗糙度 ,x射线衍射 (XRD)和Raman光谱表征膜层的结构 ,并用紫外 可见 近红外光谱仪测量其光透过率 .实验结果表明 ,衬底温度、反应气压及射频功率对金刚石膜的结晶习性、表面粗糙度及光透过率均有很大程度的影响 ,其最佳值分别为 70 0℃ ,2× 133Pa和 2 0 0W .在该最佳参量下经 1h的生长即获得连续、平滑的纳米金刚石膜 ,其平均晶粒尺寸为约 2 5nm ,表面平均粗糙度仅为 5 5nm ,在近红外区的光透过率高达 90 %

Highly transparent diamond films are successfully achieved on quartz via the radio freguency plasma enhanced hot filament chemical vapor deposition (RF HFCVD) process. Optical transmission spectra, scanning electron microscopy (SEM), surface profile, as well as x ray diffraction (XRD) and Raman scattering spectroscopy are employed to characterize the as grown films. The effects of substrate temperature, reaction gas pressure, and RF power on the structural and optical properties of the prepared films are studied. Their optimal values are 700℃, 2×133Pa and 200W, respectively. After growth for 1h at the optimal deposition parameters, the nanocrystalline diamond film can always be obtained with its grain size of about 25nm, its average surface roughness of about 5 5nm, and its optical transmission greater than 90% in the near IR region.