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电子束诱导玻璃纳米须生长的原位电镜观察 被引量:2

IN-SITU TEM OBSERVATION ON GROWTH OF GLASS NANORODS INDUCED BY ELECTRON BEAM
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摘要 在高能电子束辐照下 ,玻璃表面首先形成突起 ,在以后的辐照下以扩散限制凝聚的形式在无序态突起上生长出长度在十几到几百nm的树枝状玻璃纳米须 ,并沿玻璃法线方向生长 .这一电子束诱导现象主要是由于照射部位的温升造成的 ,玻璃纳米须的长度和生长速度与辐照时间密切相关 .辐照时间增加生长速度加快 ,在辐照 2 3min左右时生长速度最快 .整体形貌也随辐照时间而改变 ,玻璃纳米须从高低不平到高度整齐 。 Fractal theory has been developed in many fields since it was first presented in 1970s, especially fractal theory is applied in the research about nonlinear process of off equilibrium state. The scientists of our country have observed the fractal growth of gas phase solid phase transition of hydrocarbon under high energy electron beam irradiation. The growth process of glass nanorods induced by electron beam is discussed more profoundly and systematically. The growth rules of glass nanorods are found. The longer the time of electron beam irradiation, the larger the length and density of glass nanorods. The velocity of growth of glass nanorods has a maximum value at 23 min. The growth mechanism of glass nanorods is discussed.
出处 《北京师范大学学报(自然科学版)》 CAS CSCD 北大核心 2002年第4期481-485,共5页 Journal of Beijing Normal University(Natural Science)
基金 国家自然科学基金资助项目 (50 1 4 1 0 2 2 ) 国家"八六三"计划资助项目 (2 0 0 1AA380 2 0 )
关键词 高能电子束辐照 玻璃纳米须 分形生长 透射电镜原位观察 生长机制 生长速度 辐照时间 glass nanorods fractal high energy electron beam irradiation TEM in situ observation
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参考文献5

  • 1[1]Mandelbrot B B. Fractal: form, chance and dimension[M]. San Francisco: Freeman, 1977
  • 2柳得橹,张济忠.电子束辐照下碳沉积的分形生长[J].电子显微学报,1996,15(6):529-529. 被引量:6
  • 3彭菊琳.LiTaO3晶体中铁电畴界的高分辨点阵象的研究[J].电子显微学报,1985,4(3):1-1.
  • 4[4]Zhang Jizhong. Nucleation-aggregation of molybdena crystals at the vapour-solid interface[J]. J Phys: Condens Matter, 1991, 3:8005
  • 5[5]Zhang Jizhong, Liu Delu. Morphology of molybdena fractal clusters grown by vapour-phase deposition[J]. J Matter Science, 1992,27(16):4329

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  • 2张越川,张国祺.分形理论的科学和哲学底蕴[J].社会科学研究,2005(5):81-86. 被引量:18
  • 3肖沛,孙霞,闫继红,丁泽军.电子束光刻中邻近效应校正的几种方法[J].电子显微学报,2005,24(5):464-468. 被引量:7
  • 4郭华,代春丽,隋曼龄.聚焦电子束辐照原位制备单晶纳米棒[J].电子显微学报,2006,25(B08):48-49. 被引量:1
  • 5MITSUISHI K.,SHIMOJO M.,HAN M.,et al.Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons[J].Applied Physics Letters 2003,83 (10):2 064~2 066.
  • 6UTKE I,LUISIER A,HOFFMANN P,et al.Focused-electron-beam-induced deposition of freestanding three-dimensiona-1 nanostructures of pure coalesced copper crystals[J].Applied Physics Letters.2002,81(17):3 245~3 247.
  • 7JIANG HONG.Electronbeamn-induced organometallic chemical vapor deposition for nanostructure fabrication[R].Lincoln:The University of Nebraska-Lincoln,2000.
  • 8XUEKANG CHEN,AKIHARU MORIMOTO,KATSURO NAGAI,et al.Electron-Beam-Induced nucleation Centers and Selective Deposition of Thin Zinc Films[j].Jpn.J Physics,2001,41:775~777.
  • 9TARO YAM ADA,NAO TAKANO,TETSUYA OSAKA.Electron beam nanometer-scale fabrication of Si(111) using alkyl monolayers[J].RIKEN Review No.2002,45:9~21.
  • 10..Leica公司的官方网页,.

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