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Study of the Static Properties I-V of Mosfet

Study of the Static Properties I-V of Mosfet
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出处 《材料科学与工程(中英文B版)》 2013年第8期504-509,共6页 Journal of Materials Science and Engineering B
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参考文献12

  • 1T. Skotnicki, Transistor MOS and Manufacturing Engineering Technology, Electronics Treated, 1987. (in French).
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  • 4H. Mathieu, Physics of semiconductors and electronic components, 2nd Ed., Dunod, Paris, 2001. (in French).
  • 5F. Morancho, The power MOS transistor trench: Modeling and Performance Limits, University Paul Sabatier, Toulouse, 1996, p. 96482. (in French).
  • 6N.D. Arora, J.R. Hauser, D.J. Roulston, Electron and hole mobilities in silicon as a function of concentration and temperature, IEEE Transaction on Electron Devices 30 (6) (1983) 658-663.
  • 7D.B.M. Klaassen, A united mobility model for device simulation: II. Temperature dependence of carrier mobility and lifetime, Solid-State Electronics 35 (1992) 961-967.
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  • 9C. Jacobini, C. Canali, G. Ottaviani, A. Alberigi Quaranta, A review of some charge transport properties of silicon, Solid-State Electronics 20 (1977) 77-89.
  • 10N.D. Arora, MOSFET Models for VLSI Circuit Simulation-Theory and Practice, Editions Springer Verlag, 1993.

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